Book description
Three-Dimensional Integrated Circuit Design, Second Eition, expands the original with more than twice as much new content, adding the latest developments in circuit models, temperature considerations, power management, memory issues, and heterogeneous integration. 3-D IC experts Pavlidis, Savidis, and Friedman cover the full product development cycle throughout the book, emphasizing not only physical design, but also algorithms and system-level considerations to increase speed while conserving energy. A handy, comprehensive reference or a practical design guide, this book provides effective solutions to specific challenging problems concerning the design of three-dimensional integrated circuits.
Expanded with new chapters and updates throughout based on the latest research in 3-D integration:
- Manufacturing techniques for 3-D ICs with TSVs
- Electrical modeling and closed-form expressions of through silicon vias
- Substrate noise coupling in heterogeneous 3-D ICs
- Design of 3-D ICs with inductive links
- Synchronization in 3-D ICs
- Variation effects on 3-D ICs
- Correlation of WID variations for intra-tier buffers and wires
- Offers practical guidance on designing 3-D heterogeneous systems
- Provides power delivery of 3-D ICs
- Demonstrates the use of 3-D ICs within heterogeneous systems that include a variety of materials, devices, processors, GPU-CPU integration, and more
- Provides experimental case studies in power delivery, synchronization, and thermal characterization
Table of contents
- Cover image
- Title page
- Table of Contents
- Copyright
- Dedication
- List of Figures
- About the Authors
- Preface to the Second Edition
- Preface to the First Edition
- Acknowledgments
- Organization of the Book
- Chapter 1. Introduction
- Chapter 2. Manufacturing of Three-Dimensional Packaged Systems
- Chapter 3. Manufacturing Technologies for Three-Dimensional Integrated Circuits
-
Chapter 4. Electrical Properties of Through Silicon Vias
- Abstract
- 4.1 Physical Characteristics of a Through Silicon Via
- 4.2 Electrical Model of Through Silicon Via
- 4.3 Modeling a Three-Dimensional Via as a Cylinder
- 4.4 Compact Models
- 4.5 Through Silicon Via Impedance Models
- 4.6 Electrical Characterization Through Numerical Simulation
- 4.7 Case Study—Through Silicon Via Characterization of the MITLL TSV process
- 4.8 Summary
- Chapter 5. Substrate Noise Coupling in Heterogeneous Three-Dimensional ICs
- Chapter 6. Three-Dimensional ICs with Inductive Links
- Chapter 7. Interconnect Prediction Models
- Chapter 8. Cost Considerations for Three-Dimensional Integration
- Chapter 9. Physical Design Techniques for Three-Dimensional ICs
- Chapter 10. Timing Optimization for Two-Terminal Interconnects
- Chapter 11. Timing Optimization for Multiterminal Interconnects
- Chapter 12. Thermal Modeling and Analysis
- Chapter 13. Thermal Management Strategies for Three-Dimensional ICs
- Chapter 14. Case Study: Thermal Coupling in 3-D Integrated Circuits
- Chapter 15. Synchronization in Three-Dimensional ICs
-
Chapter 16. Case Study: Clock Distribution Networks for Three-Dimensional ICs
- Abstract
- 16.1 MIT Lincoln Laboratories Three-Dimensional IC Fabrication Technology
- 16.2 Three-Dimensional Test Circuit Architecture
- 16.3 Clock Distribution Network Structures Within the Test Circuit
- 16.4 Models of the Clock Distribution Network Topologies Incorporating Three-Dimensional Via Impedance
- 16.5 Experimental Results
- 16.6 Summary
- Chapter 17. Variability Issues in Three-Dimensional ICs
-
Chapter 18. Power Delivery for Three-Dimensional ICs
- Abstract
- 18.1 The Power Delivery Challenge
- 18.2 Models for Three-Dimensional Power Distribution Networks
- 18.3 Through Silicon Via Technologies to Mitigate Power Supply Noise
- 18.4 Decoupling Capacitance for Three-Dimensional Power Distribution Networks
- 18.5 Wire Sizing Methods in Three-Dimensional Power Distribution Networks
- 18.6 Summary
- Chapter 19. Case Study: 3-D Power Distribution Topologies and Models
- Chapter 20. 3-D Circuit Architectures
- Chapter 21. Conclusions
- Appendix A. Enumeration of Gate Pairs in a 3-D IC
- Appendix B. Formal Proof of Optimum Single Via Placement
- Appendix C. Proof of the Two-Terminal Via Placement Heuristic
- Appendix D. Proof of Condition for Via Placement of Multi-terminal Nets
- Appendix E. Correlation of WID Variations for Intratier Buffers
- Appendix F. Extension of the Proposed Model to Include Variations of Wires
- Glossary of Terms
- References
- Index
Product information
- Title: Three-Dimensional Integrated Circuit Design, 2nd Edition
- Author(s):
- Release date: July 2017
- Publisher(s): Morgan Kaufmann
- ISBN: 9780124104846
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