Plasma immersion ion implantation (PIII) of light alloys
Y.C. Xin, City University of Hong Kong, China, Chongqing University, China
P.K. Chu, City University of Hong Kong, China
Abstract:
Plasma immersion ion implantation (PIII) or plasma source ion implantation (PSII), which overcomes the line-of-sight limitation inherent to beam-line ion implantation is an important surface modification technique for light alloys. In this chapter, the processes and advantages of the PIII technique are introduced, which is followed by an up-to-date overview of the progress and current status of PIII surface modification of light alloys including Mg, Al and Ti alloys. The structural changes in light alloys after PIII and the resulting improvements ...
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