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Sputtering techniques for epitaxial growth of complex oxides

M. Dawber     Stony Brook University, Stony Brook, NY, USA

Abstract

High-quality epitaxial thin films and superlattices of complex oxides can be achieved using sputter deposition, often at a significantly lower cost than other techniques. Rather than presenting a detailed history of the use of sputtering for complex oxides, this chapter emphasizes the considerations that need to be taken into account to achieve high-quality growth and presents a practical guide highlighting results and procedures from my own laboratory.

Keywords

Complex oxides; Epitaxy; Ferroelectric; Sputtering

2.1. Introduction

Sputter deposition is a widely used physical vapor deposition method and has advantages over ...

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